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K-MSX is a general-purpose type device series.
Equipment to have aimed at use by research and development at time
such as condition putting out in Pilot Line.
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Measurement by X-ray |
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XRR(X-ray reflection) is able to measure an absolute value without the effect of
the density, composition, electrical conductivity, permittivity and absorptivity of
light and crystal construction.
XRF(X-ray fluorescence) is able to measure an element from Al to U at a time.
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Measurement sample |
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Sample stage is manual loading structure. It does not depend on the sample
shape.
It supports to 300mm wafer, 200mm x 200mm rigid or flexible sample.
It is able to support various sample, resin material, film, and indeterminate form sample.
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Superior cost performance |
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It is set to optimum price for new installation or replacement of equipment.
Initial cost is low because minimum X-ray unit is installed.
It is able to add X-ray unit after delivery of the equipment.
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X-ray reflection unit (XRR) |
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It is able to select 3 X-ray units max.
An absolute value measurement of thickness and density, for metallic film, transparent film,
etc.
A measurement of thickness and density for multilayer film.
Non-destructive and non-contact measurement.
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X-ray fluorescence unit (XRF) |
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A measurement
of thickness for metallic film in a short time.
A measurement
of composition ratio for chemical compound.
It is able to
measure of thickness and composition at a time.
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Grazing incidence X-ray fluorescence unit (GIXRF) |
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It isolates a
film stack and measures to thickness and composition.
A precision measurement
for super-thin film.
It is able to
measure of thickness and composition at a time.
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Option |
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If it installed
option camera, it is able to
measure precision of small sample.
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Software |
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Analytical
software for Windows is installed as standard.
It has various function, statistical processing of average value and coefficient
of variance from database,
and reporting results automatically.
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Item |
Specification |
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X-ray tube |
Packaged X-ray tube (Cooling: water) |
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Spot size |
1~20mm |
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Detector |
Semiconductor Detector (Non Liquid Nitorogen) |
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Sample stage |
~300mmƒÓ, ~200mm square, Auto mapping |
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Sample thickness |
~10mm |
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Sample height adjust |
Laser adjustment |
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Sample alignment |
Camera (Option), Selecting position |
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Control & analysis software |
Development software |
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Special analysis software (Option) |
XRR theorical parameter fitting software, FP software |
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Equipment size |
1.1m² |
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Electricity |
AC200V, 20A |
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Cooling water |
0.25~0.35MPa, 5L/min |
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Vacuum |
-65kPa, 20NL/min |
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